中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The PL "violet shift" of cerium dioxide on silicon

文献类型:期刊论文

作者Chai CL ; Yang SY ; Liu ZK ; Liao MY ; Chen NF ; Wang ZG
刊名chinese science bulletin
出版日期2001
卷号46期号:24页码:2046-2048
关键词cerium dioxide thin film PL violet shift THIN-FILMS DEPOSITION CEO2 INTERFACE OXIDES GROWTH
ISSN号1001-6538
通讯作者chai cl,chinese acad sci,inst semicond,lab semicond mat sci,beijing 100083,peoples r china.
中文摘要ceo2 thin film was fabricated by dual ion beam epitaxial technique. the phenomenon of pl violet shift at room temperature was observed, and the distance of shift was about 65 nm. after the analysis of crystal structure and valence in the compound were carried out by xrd and xps technique, it was concluded that the pl shift was related with valence of cerium ion in the oxides. when the valence of cerium ion varied front tetravalence to trivalence, the pl peak position would move from blue region to violet region and the phenomenon of "violet shift" was observed.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/12010]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Chai CL,Yang SY,Liu ZK,et al. The PL "violet shift" of cerium dioxide on silicon[J]. chinese science bulletin,2001,46(24):2046-2048.
APA Chai CL,Yang SY,Liu ZK,Liao MY,Chen NF,&Wang ZG.(2001).The PL "violet shift" of cerium dioxide on silicon.chinese science bulletin,46(24),2046-2048.
MLA Chai CL,et al."The PL "violet shift" of cerium dioxide on silicon".chinese science bulletin 46.24(2001):2046-2048.

入库方式: OAI收割

来源:半导体研究所

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