中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Investigation of {111}A and {111} planes of c-GaN epilayers grown on GaAs(001) by MOCVD

文献类型:期刊论文

作者Zheng XH ; Qu B ; Wang YT ; Feng ZH ; Han JY ; Yang H ; Liang JW
刊名journal of crystal growth
出版日期2001
卷号233期号:1-2页码:52-56
关键词X-ray diffraction metalorganic chemical vapor deposition gallium compounds HEXAGONAL GAN CUBIC GAN GAAS
ISSN号0022-0248
通讯作者zheng xh,chinese acad sci,inst semicond,r&d ctr optoelec technol,pob 912,beijing 100083,peoples r china.
中文摘要a determination of {1 1 1}a and {1 1 1}b in cubic gan(c-gan) was investigated by x-ray diffraction technique in detail. the c-gan films are grown on gaas(0 0 1) substrates by metalorganic chemical vapor deposition(mocvd). the difference of integrated intensities measured by omega scan for the different order diffractions from {1 1 1}a and {1 1 1}b planes in the four-circle diffractometer gives convincing evidence as to which is the {1 1 1}a and which is the {1 1 1}b planes. the lesser deviation between the ratios of /f-h k l/(2)//f-(h) over bar (k) over bar (l) over bar/(2) and the calculated values after dispersion correction for atomic scattering factor shows that the content of parasitic hexagonal gan(h-gan) grown on c-gan{1 1 1}a planes is higher than that on {1 1 1}b planes. the reciprocal space mappings provide additional proof that the h-gan inclusions in c-gan films appear as lamellar structure. (c) 2001 published by elsevier science b.v.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/12102]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Zheng XH,Qu B,Wang YT,et al. Investigation of {111}A and {111} planes of c-GaN epilayers grown on GaAs(001) by MOCVD[J]. journal of crystal growth,2001,233(1-2):52-56.
APA Zheng XH.,Qu B.,Wang YT.,Feng ZH.,Han JY.,...&Liang JW.(2001).Investigation of {111}A and {111} planes of c-GaN epilayers grown on GaAs(001) by MOCVD.journal of crystal growth,233(1-2),52-56.
MLA Zheng XH,et al."Investigation of {111}A and {111} planes of c-GaN epilayers grown on GaAs(001) by MOCVD".journal of crystal growth 233.1-2(2001):52-56.

入库方式: OAI收割

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。