中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Fine structure of the plasmon resonance absorption peak of Ag nanoparticles embedded in partially oxidized Si matrix

文献类型:期刊论文

作者Yang L ; Li GH ; Zhang JG ; Zhang LD ; Liu YL ; Wang QM
刊名applied physics letters
出版日期2001
卷号78期号:1页码:102-104
关键词SMALL METAL PARTICLES OPTICAL-PROPERTIES DEPENDENCE SURFACE SILVER BULK
ISSN号0003-6951
通讯作者yang l,chinese acad sci,inst solid state phys,hefei 230031,peoples r china.
中文摘要ag/si nanocomposite films were prepared by the radio-frequency magnetron cosputtering method. the fine structure of the plasmon resonance absorption peak was found in film samples. x-ray photoelectron spectroscopy analysis indicated that the samples were composed of a two-layer structure, which accounted for the structure of the optical absorption spectra. the peak located near 445 nm is the plasmon resonance absorption peak of ag nanoparticles embedded in a partially oxidized si matrix. its intensity decreases with decreasing film thickness and disappears in a very thin sample. the peak located near 380 nm originates from the plasmon resonance absorption of the thoroughly oxidized surface layer of the sample. its intensity does not change with increasing thickness, but it cannot be observed in the very thick sample. (c) 2001 american institute of physics.
学科主题半导体物理
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/12328]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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Yang L,Li GH,Zhang JG,et al. Fine structure of the plasmon resonance absorption peak of Ag nanoparticles embedded in partially oxidized Si matrix[J]. applied physics letters,2001,78(1):102-104.
APA Yang L,Li GH,Zhang JG,Zhang LD,Liu YL,&Wang QM.(2001).Fine structure of the plasmon resonance absorption peak of Ag nanoparticles embedded in partially oxidized Si matrix.applied physics letters,78(1),102-104.
MLA Yang L,et al."Fine structure of the plasmon resonance absorption peak of Ag nanoparticles embedded in partially oxidized Si matrix".applied physics letters 78.1(2001):102-104.

入库方式: OAI收割

来源:半导体研究所

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