Carbon film deposited by mass-selected low energy ion beam technique and ion bombardment effect
文献类型：期刊论文
| 作者 | Liao MY ; Zhang JH ; Qin FG ; Liu ZK ; Yang SY ; Wang ZG ; Lee ST |
| 刊名 | acta physica sinica
 |
| 出版日期 | 2000 |
| 卷号 | 49期号:11页码:2186-2190 |
| 关键词 | amorphous carbon ion bombardment mass-selected low energy ion beam CHEMICAL-VAPOR-DEPOSITION BIAS-ENHANCED NUCLEATION DIAMOND FILMS RAMAN-SCATTERING GROWTH SILICON MECHANISM |
| ISSN号 | 1000-3290 |
| 通讯作者 | liao my,chinese acad sci,inst semicond,lab semicond mat sci,beijing 100083,peoples r china. |
| 中文摘要 | by mass-selected low energy ion beam deposition, amorphous carbon film was obtained. x-ray diffraction, raman and auger electron spectroscopy depth line shape measurements showed that such carbon films contained diamond particles. the main growth mechanism is subsurface implantation. furthermore, it was indicated in a different way that ion bombardment played a decisive role in bias enhanced nucleation of chemical vapor deposition diamond. |
| 学科主题 | 半导体物理 |
| 收录类别 | SCI |
| 语种 | 中文 |
| 公开日期 | 2010-08-12 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/12376]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Liao MY,Zhang JH,Qin FG,et al. Carbon film deposited by mass-selected low energy ion beam technique and ion bombardment effect[J]. acta physica sinica,2000,49(11):2186-2190. |
| APA | Liao MY.,Zhang JH.,Qin FG.,Liu ZK.,Yang SY.,...&Lee ST.(2000).Carbon film deposited by mass-selected low energy ion beam technique and ion bombardment effect.acta physica sinica,49(11),2186-2190. |
| MLA | Liao MY,et al."Carbon film deposited by mass-selected low energy ion beam technique and ion bombardment effect".acta physica sinica 49.11(2000):2186-2190. |
入库方式： OAI收割
来源：半导体研究所
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