中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Polycrystalline silicon films prepared by improved pulsed rapid thermal annealing

文献类型:期刊论文

作者Zhao YW ; Wang WJ ; Yun F ; Xu Y ; Liao XB ; Ma ZX ; Yue GH ; Kong GL
刊名solar energy materials and solar cells
出版日期2000
卷号62期号:1-2页码:143-148
关键词pulsed rapid thermal annealing (PRTA) solid-phase crystallization (SPC) a-Si film polycrystalline Si film AMORPHOUS-SILICON CRYSTALLIZATION TRANSISTORS
ISSN号0927-0248
通讯作者zhao yw,beijing solar energy res inst,beijing 100083,peoples r china.
中文摘要an improved pulsed rapid thermal annealing (prta) has been used for the solid-phase crystallization (spc) of a-si films prepared by pecvd. the spc can be completed with time-temperature budgets such as 10 cycles of 60-s 550 degrees c thermal bias/1-s 850 degrees c thermal pulse. the microstructure and surface morphology of the crystallized films are investigated by x-ray diffraction (xrd). the results indicate that this prta is a suitable post-crystallization technique for fabricating large-area poly-si films on low-cost substrate. (c) 2000 elsevier science b.v. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/12624]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Zhao YW,Wang WJ,Yun F,et al. Polycrystalline silicon films prepared by improved pulsed rapid thermal annealing[J]. solar energy materials and solar cells,2000,62(1-2):143-148.
APA Zhao YW.,Wang WJ.,Yun F.,Xu Y.,Liao XB.,...&Kong GL.(2000).Polycrystalline silicon films prepared by improved pulsed rapid thermal annealing.solar energy materials and solar cells,62(1-2),143-148.
MLA Zhao YW,et al."Polycrystalline silicon films prepared by improved pulsed rapid thermal annealing".solar energy materials and solar cells 62.1-2(2000):143-148.

入库方式: OAI收割

来源:半导体研究所

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