Microstructures of microcrystalline silicon thin films prepared by hot wire chemical vapor deposition
文献类型：期刊论文
| 作者 | Zhu M ; Guo X ; Chen G ; Han H ; He M ; Sun K |
| 刊名 | thin solid films
 |
| 出版日期 | 2000 |
| 卷号 | 360期号:1-2页码:205-212 |
| 关键词 | microstructures microcrystalline silicon hot wire chemical vapor deposition AMORPHOUS-SILICON HYDROGEN PLASMA SPECTRA GROWTH SILANE |
| ISSN号 | 0040-6090 |
| 通讯作者 | zhu m,univ sci & technol china,grad sch,pob 3908,beijing 100039,peoples r china. |
| 中文摘要 | undoped hydrogenated microcrystalline silicon (mu c-si:h) thin films were prepared at low temperature by hot wire chemical vapor deposition (hwcvd). microstructures of the mu c-si:h films with different h-2/sih4 ratios and deposition pressures have been characterized by infrared spectroscopy x-ray diffraction (xrd), raman scattering, fourier transform (ftir), cross-sectional transmission electron microscopy (tem) and small angle x-ray scattering (sax). the crystallization of silicon thin film was enhanced by hydrogen dilution and deposition pressure. the tem result shows the columnar growth of mu c-si:h thin films. an initial microcrystalline si layer on the glass substrate, instead of the amorphous layer commonly observed in plasma enhanced chemical vapor deposition (pecvd), was observed from tem and backside incident raman spectra. the saxs data indicate an enhancement of the mass density of mu c-si:h films by hydrogen dilution. finally, combining the ftir data with the saxs experiment suggests that the si--h bonds in mu c-si:h and in polycrystalline si thin films are located at the grain boundaries. (c) 2000 elsevier science s.a. all rights reserved. |
| 学科主题 | 半导体材料 |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2010-08-12 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/12694]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Zhu M,Guo X,Chen G,et al. Microstructures of microcrystalline silicon thin films prepared by hot wire chemical vapor deposition[J]. thin solid films,2000,360(1-2):205-212. |
| APA | Zhu M,Guo X,Chen G,Han H,He M,&Sun K.(2000).Microstructures of microcrystalline silicon thin films prepared by hot wire chemical vapor deposition.thin solid films,360(1-2),205-212. |
| MLA | Zhu M,et al."Microstructures of microcrystalline silicon thin films prepared by hot wire chemical vapor deposition".thin solid films 360.1-2(2000):205-212. |
入库方式： OAI收割
来源：半导体研究所
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