中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
TEM study of dislocations in ZnTe/GaAs heterostructure grown by hot-wall epitaxy

文献类型:期刊论文

作者Han PD
刊名defect and diffusion forum
出版日期1999
卷号174期号:0页码:59-65
ISSN号1012-0386
关键词HREM large-angle stereo-projection misfit dislocations stacking faults TEM LAYER SUPERLATTICES ELECTRON-MICROSCOPY
通讯作者 
中文摘要a znte layer grown on gaas substrate by hot-wall epitaxy (hwe) was studied using transmission electron microscopy (tem). for a (110) cross-sectional specimen, its (001) znte/gaas interface was analysed by large angle stereo-projection (lasp) and high resolution electron microscopy (hrem). in the lasp, a double diffraction occurred and moire fringes were formed, meanwhile misfit dislocations were revealled clearly by weak beam technique. in hrem, not only lomer and 60 degrees types of misfit dislocations were observed, but also two types of stacking faults were analysed. the residual strain was estimated by both methods.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/12816]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Han PD. TEM study of dislocations in ZnTe/GaAs heterostructure grown by hot-wall epitaxy[J]. defect and diffusion forum,1999,174(0):59-65.
APA Han PD.(1999).TEM study of dislocations in ZnTe/GaAs heterostructure grown by hot-wall epitaxy.defect and diffusion forum,174(0),59-65.
MLA Han PD."TEM study of dislocations in ZnTe/GaAs heterostructure grown by hot-wall epitaxy".defect and diffusion forum 174.0(1999):59-65.

入库方式: OAI收割

来源:半导体研究所

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