中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Influence of crystal perfection on the reverse leakage current of the SiGe Si p-n heterojunction diodes

文献类型:期刊论文

作者Liu XF
刊名journal of crystal growth
出版日期1999
卷号201期号:0页码:551-555
关键词reverse leakage current crystalline quality SiGe Se p-n heterojunction diodes LAYERS
ISSN号0022-0248
通讯作者liu xf,chinese acad sci,inst semicond,mat ctr,beijing 100083,peoples r china.
中文摘要double-crystal x-ray diffraction and i-v characterization have been carried out on the gsmbe grown sige/si p-n heterojunction materials. results show that the sige alloys crystalline quality and the misfit dislocations are critical influences on the reverse leakage current. the crystal perfection and/or the degree of metastability of the sice alloys have been estimated in terms of the model proposed by tsao with the experimental results. high-quality p-n heterojunction diodes can be obtained by optimizing the sige alloy structures, which limit the alloys in the metastable states. (c) 1999 elsevier science b.v. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/12900]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Liu XF. Influence of crystal perfection on the reverse leakage current of the SiGe Si p-n heterojunction diodes[J]. journal of crystal growth,1999,201(0):551-555.
APA Liu XF.(1999).Influence of crystal perfection on the reverse leakage current of the SiGe Si p-n heterojunction diodes.journal of crystal growth,201(0),551-555.
MLA Liu XF."Influence of crystal perfection on the reverse leakage current of the SiGe Si p-n heterojunction diodes".journal of crystal growth 201.0(1999):551-555.

入库方式: OAI收割

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。