中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Native-oxidized InAlAs blocking layer buried heterostructure InGaAsP-InP MQW laser for high-temperature operation

文献类型:期刊论文

作者Jie WZ ; Jin CS ; Fan Z ; Jie WX ; Wei W ; Han WR
刊名ieee photonics technology letters
出版日期1999
卷号11期号:1页码:3-5
关键词CVD insulation leakage currents oxidation quantum-well lasers semiconductor heterojunctions thermal factors DIODES LEAKAGE CURRENT
ISSN号1041-1135
通讯作者jie wz,natl univ singapore,inst mat res & engn,singapore 119260,singapore.
中文摘要a novel idea of inalas native oxide utilized to replace the p-n-p-n thyristor blocking layer and improve the high-temperature performance of buried heterostructure ingaasp-inp laser is first proposed and demonstrated. a characteristic temperature (t-0) of 50 k is achieved from an ina1as native oxide buried heterostructure (nobh) ingaasp-inp multiquantum-well laser with 1.5-mu m-wide diode leakage passage path. the threshold current and slope efficiency of nobh laser changes from 5.6 ma, 0.23 mw/ma to 28 ma, 0.11 mw/ma with the operating temperature changing from 20 degrees c to 100 degrees c. it is comparable to conventional p-n reverse biased junction bh laser with minimized diode leakage current, and is much better than the buried ridge strip with proton implanted laterally confinement laser.
学科主题光电子学
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/13030]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Jie WZ,Jin CS,Fan Z,et al. Native-oxidized InAlAs blocking layer buried heterostructure InGaAsP-InP MQW laser for high-temperature operation[J]. ieee photonics technology letters,1999,11(1):3-5.
APA Jie WZ,Jin CS,Fan Z,Jie WX,Wei W,&Han WR.(1999).Native-oxidized InAlAs blocking layer buried heterostructure InGaAsP-InP MQW laser for high-temperature operation.ieee photonics technology letters,11(1),3-5.
MLA Jie WZ,et al."Native-oxidized InAlAs blocking layer buried heterostructure InGaAsP-InP MQW laser for high-temperature operation".ieee photonics technology letters 11.1(1999):3-5.

入库方式: OAI收割

来源:半导体研究所

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