中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Heteroepitaxy of cubic GaN: influence of interface structure

文献类型:期刊论文

作者Trampert A ; Brandt O ; Yang H ; Yang B ; Ploog KH
刊名microscopy of semiconducting materials 1997
出版日期1997
卷号157期号:0页码:205-208
关键词MOLECULAR-BEAM EPITAXY GAN/GAAS(001) GROWTH
ISSN号0951-3248
通讯作者trampert a,paul drude inst festkorperelekt,hausvogteipl 5-7,d-10117 berlin,germany.
中文摘要we report on the epitaxial growth and the microstructure of cubic gan. the layers are deposited by plasma-assisted molecular beam epitaxy on gaas and si substrates. despite the extreme lattice mismatch between these materials, gan grows in the metastable cubic phase with a well-defined orientation-relationship to the gaas substrate including a sharp heteroboundary. the preference of the metastable phase and its epitaxial orientation originates in the interface structure which is found to be governed by a coincidence site lattice.
学科主题半导体物理
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/13276]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Trampert A,Brandt O,Yang H,et al. Heteroepitaxy of cubic GaN: influence of interface structure[J]. microscopy of semiconducting materials 1997,1997,157(0):205-208.
APA Trampert A,Brandt O,Yang H,Yang B,&Ploog KH.(1997).Heteroepitaxy of cubic GaN: influence of interface structure.microscopy of semiconducting materials 1997,157(0),205-208.
MLA Trampert A,et al."Heteroepitaxy of cubic GaN: influence of interface structure".microscopy of semiconducting materials 1997 157.0(1997):205-208.

入库方式: OAI收割

来源:半导体研究所

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