Low Temperature Deposited Nano-structured Vanadium Oxide Thin Films for Uncooled Infrared Detectors
文献类型：会议论文
| 作者 | Li GK ; Liu J
|
| 出版日期 | 2008 |
| 会议名称 | 2nd ieee international nanoelectronics conference |
| 会议日期 | mar 24-27, 2008 |
| 会议地点 | shanghai, peoples r china |
| 页码 | vols 1-3: 921-923 |
| 通讯作者 | li, gk, chinese acad sci, inst semicond, natl lab superlattices & microstruct, beijing 100083, peoples r china. |
| 中文摘要 | a novel process of room temperature ion beam sputtering deposition of vanadium oxide films and low temperature post annealing for uncooled infrared detectors was proposed in this work. vox thin films with relatively low square resistance (70 k omega / square) and large temperature coefficient of resistance (more than 3%/k) at room temperature were fabricated using this low temperature process which was very compatible with the process of uncooled infrared detectors based on micromachined technology. furthermore, chemical composition and film surface have been characterized using x-ray photoelectron spectroscopy (xps) and scanning electron microscopy (sem) respectively. the results showed that the main composition of the processed thin films was v2o5 and the thin films were in the process of crystallization. |
| 英文摘要 | a novel process of room temperature ion beam sputtering deposition of vanadium oxide films and low temperature post annealing for uncooled infrared detectors was proposed in this work. vox thin films with relatively low square resistance (70 k omega / square) and large temperature coefficient of resistance (more than 3%/k) at room temperature were fabricated using this low temperature process which was very compatible with the process of uncooled infrared detectors based on micromachined technology. furthermore, chemical composition and film surface have been characterized using x-ray photoelectron spectroscopy (xps) and scanning electron microscopy (sem) respectively. the results showed that the main composition of the processed thin films was v2o5 and the thin films were in the process of crystallization.; zhangdi于2010-03-09批量导入; zhangdi于2010-03-09批量导入; ieee.; [li, guike; liu, jian; wu, nanjian] chinese acad sci, inst semicond, natl lab superlattices & microstruct, beijing 100083, peoples r china |
| 收录类别 | 其他 |
| 会议主办者 | ieee. |
| 会议录 | 2008 2nd ieee international nanoelectronics conference
 |
| 会议录出版者 | ieee ; 345 e 47th st, new york, ny 10017 usa |
| 学科主题 | 微电子学 |
| 会议录出版地 | 345 e 47th st, new york, ny 10017 usa |
| 语种 | 英语 |
| ISBN号 | 978-1-4244-1572-4 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/7756]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Li GK,Liu J. Low Temperature Deposited Nano-structured Vanadium Oxide Thin Films for Uncooled Infrared Detectors[C]. 见:2nd ieee international nanoelectronics conference. shanghai, peoples r china. mar 24-27, 2008. |
入库方式： OAI收割
来源：半导体研究所
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