中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Growth behavior of AlInGaN films

文献类型:会议论文

作者Shang JZ ; Zhang BP ; Mao MH ; Cai LE ; Zhang JY ; Fang ZL ; Liu BL ; Yu JZ ; Wang QM ; Kusakabe K ; Ohkawa K
出版日期2009
会议名称4th asian conference on crystal growth and crystal technology
会议日期may 21-24, 2008
会议地点sendai, japan
关键词Scanning electron microscope
页码311 (3): 474-477 jan 15
通讯作者zhang, bp, xiamen univ, dept phys, xiamen 361005, peoples r china.
中文摘要the structural and surface properties of alingan quaternary films grown at different temperatures on gan templates by metalorganic chemical vapor deposition are investigated. formation of two quaternary layers is confirmed and the difference between them is pronounced when the growth temperature is increased. the surface is featured with v-shaped pits and cracks, whose characteristics are further found to be strongly dependent on the growth temperature of alingan layers. the two-layer structure is interpreted by taking into account of the strain status in alingan layers. (c) 2008 elsevier b.v. all rights reserved.
英文摘要the structural and surface properties of alingan quaternary films grown at different temperatures on gan templates by metalorganic chemical vapor deposition are investigated. formation of two quaternary layers is confirmed and the difference between them is pronounced when the growth temperature is increased. the surface is featured with v-shaped pits and cracks, whose characteristics are further found to be strongly dependent on the growth temperature of alingan layers. the two-layer structure is interpreted by taking into account of the strain status in alingan layers. (c) 2008 elsevier b.v. all rights reserved.; zhangdi于2010-03-09批量导入; zhangdi于2010-03-09批量导入; intelligent cosmos acad fdn.; murata sci fdn.; sendaitourism & convent bureau.; [shang, j. z.; zhang, b. p.; mao, m. h.; cai, l. e.; zhang, j. y.; fang, z. l.; liu, b. l.; yu, j. z.; wang, q. m.] xiamen univ, dept phys, xiamen 361005, peoples r china; [shang, j. z.; zhang, b. p.; mao, m. h.; cai, l. e.; zhang, j. y.; fang, z. l.; liu, b. l.; yu, j. z.; wang, q. m.] xiamen univ, semicond photon res ctr, xiamen 361005, peoples r china; [zhang, j. y.; yu, j. z.; wang, q. m.] chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china; [kusakabe, k.; ohkawa, k.] tokyo univ sci, dept appl phys, shinjuku ku, tokyo 1628601, japan
收录类别其他
会议主办者intelligent cosmos acad fdn.; murata sci fdn.; sendaitourism & convent bureau.
会议录journal of crystal growth
会议录出版者elsevier science bv ; po box 211, 1000 ae amsterdam, netherlands
学科主题光电子学
会议录出版地po box 211, 1000 ae amsterdam, netherlands
语种英语
ISSN号0022-0248
源URL[http://ir.semi.ac.cn/handle/172111/8324]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Shang JZ,Zhang BP,Mao MH,et al. Growth behavior of AlInGaN films[C]. 见:4th asian conference on crystal growth and crystal technology. sendai, japan. may 21-24, 2008.

入库方式: OAI收割

来源:半导体研究所

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