SOI submicron rib waveguides: Design, Fabrication and Characterization
文献类型：会议论文
| 作者 | Li ZY
|
| 出版日期 | 2008 |
| 会议名称 | 5th ieee international conference on group iv photonics |
| 会议日期 | sep 17-19, 2008 |
| 会议地点 | sorrento, italy |
| 页码 | : 137-139 |
| 通讯作者 | yu, jz, chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china. |
| 中文摘要 | we present detailed design, fabrication, and characterization issues of submicron rib waveguides based on silicon-on-insulator. the waveguides fabricated by ebl and icp processes have propagation loss of 1.8db/mm and bend loss of 0.14db/90 degrees for bends with radius of 5 mu m. |
| 英文摘要 | we present detailed design, fabrication, and characterization issues of submicron rib waveguides based on silicon-on-insulator. the waveguides fabricated by ebl and icp processes have propagation loss of 1.8db/mm and bend loss of 0.14db/90 degrees for bends with radius of 5 mu m.; zhangdi于2010-03-09批量导入; zhangdi于2010-03-09批量导入; ieee.; informat soc technol.; helios.; [xu, xuejun; chen, shaowu; li, zhiyong; yu, yude; yu, jinzhong] chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china |
| 收录类别 | 其他 |
| 会议主办者 | ieee.; informat soc technol.; helios. |
| 会议录 | 2008 5th ieee international conference on group iv photonics
 |
| 会议录出版者 | ieee ; 345 e 47th st, new york, ny 10017 usa |
| 学科主题 | 光电子学 |
| 会议录出版地 | 345 e 47th st, new york, ny 10017 usa |
| 语种 | 英语 |
| ISBN号 | 978-1-4244-1769-8 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/8340]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Li ZY. SOI submicron rib waveguides: Design, Fabrication and Characterization[C]. 见:5th ieee international conference on group iv photonics. sorrento, italy. sep 17-19, 2008. |
入库方式： OAI收割
来源：半导体研究所
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