Characteristics of SOI rib waveguide microring and racetrack resonators
文献类型:会议论文
作者 | Huang, QZ ; Xiao, X ; Li, YT ; Yu, YD ; Yu, JZ |
出版日期 | 2008 |
会议名称 | 5th ieee international conference on group iv photonics |
会议日期 | sep 17-19, 2008 |
会议地点 | sorrento, italy |
关键词 | Resonators submicron rib waveguides silicon-on-insulator electron beam lithography |
页码 | : 143-145 |
通讯作者 | yu, jz, chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china. |
中文摘要 | characteristics of microring/racetrack resonators, in submicron soi rib waveguides, have been investigated. the effects of waveguide dimensions, coupler design, roughness, and oxide cladding are considered. moreover, guided mode, loss and dispersion of such waveguides are analyzed. |
英文摘要 | characteristics of microring/racetrack resonators, in submicron soi rib waveguides, have been investigated. the effects of waveguide dimensions, coupler design, roughness, and oxide cladding are considered. moreover, guided mode, loss and dispersion of such waveguides are analyzed.; zhangdi于2010-03-09批量导入; made available in dspace on 2010-03-09t07:08:19z (gmt). no. of bitstreams: 1 309.pdf: 777022 bytes, checksum: 08b64da8802c72829e34ea2ddba55b12 (md5) previous issue date: 2008; ieee.; informat soc technol.; helios.; [huang, qingzhong; xiao, xi; li, yuntao; yu, yude; yu, jinzhong] chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china |
收录类别 | CPCI-S |
会议主办者 | ieee.; informat soc technol.; helios. |
会议录 | 2008 5th ieee international conference on group iv photonics
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会议录出版者 | ieee ; 345 e 47th st, new york, ny 10017 usa |
学科主题 | 光电子学 |
会议录出版地 | 345 e 47th st, new york, ny 10017 usa |
语种 | 英语 |
ISBN号 | 978-1-4244-1769-8 |
源URL | [http://ir.semi.ac.cn/handle/172111/8344] ![]() |
专题 | 半导体研究所_中国科学院半导体研究所(2009年前) |
推荐引用方式 GB/T 7714 | Huang, QZ,Xiao, X,Li, YT,et al. Characteristics of SOI rib waveguide microring and racetrack resonators[C]. 见:5th ieee international conference on group iv photonics. sorrento, italy. sep 17-19, 2008. |
入库方式: OAI收割
来源:半导体研究所
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