中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Delay of the excited state lasing of 1310 nm InAs/GaAs quantum dot lasers by facet coating

文献类型:期刊论文

作者Cao YL (Cao Yu-Lian) ; Yang T (Yang Tao) ; Xu PF (Xu Peng-Fei) ; Ji HM (Ji Hai-Ming) ; Gu YX (Gu Yong-Xian) ; Wang XD (Wang Xiao-Dong) ; Wang Q (Wang Qing) ; Ma WQ (Ma Wen-Quan) ; Chen LH (Chen Liang-Hui)
刊名applied physics letters
出版日期2010
卷号96期号:17页码:art. no. 171101
关键词excited states gallium arsenide III-V semiconductors indium compounds laser tuning optical films quantum dot lasers silicon compounds tantalum compounds TEMPERATURE-DEPENDENCE THRESHOLD PERFORMANCE GAIN
通讯作者yang, t, chinese acad sci, inst semicond, key lab semicond mat sci, beijing 100083, peoples r china. 电子邮箱地址: tyang@semi.ac.cn
合作状况其它
英文摘要in this letter, we present a facet coating design to delay the excited state (es) lasing for 1310 nm inas/gaas quantum dot lasers. the key point of our design is to ensure that the mirror loss of es is larger than that of the ground state by decreasing the reflectivity of the es. in the facet coating design, the central wavelength is at 1480 nm, and the high- and low-index materials are ta2o5 and sio2, respectively. compared with the traditional si/sio2 facet coating with a central wavelength of 1310 nm, we have found that with the optimal design the turning temperature of the es lasing has been delayed from 90 to 100 degrees c for the laser diodes with cavity length of 1.2 mm. furthermore, the characteristic temperature (t-0) of the laser diodes is also improved.; submitted by 阎军 (yanj@red.semi.ac.cn) on 2010-05-24t07:15:03z no. of bitstreams: 1 delay of the excited state lasing of 1310 nm inasgaas quantum dot lasers by facet coating.pdf: 391400 bytes, checksum: e58506e581d2b497a385d9136eccd125 (md5); approved for entry into archive by 阎军(yanj@red.semi.ac.cn) on 2010-05-24t07:17:42z (gmt) no. of bitstreams: 1 delay of the excited state lasing of 1310 nm inasgaas quantum dot lasers by facet coating.pdf: 391400 bytes, checksum: e58506e581d2b497a385d9136eccd125 (md5); made available in dspace on 2010-05-24t07:17:42z (gmt). no. of bitstreams: 1 delay of the excited state lasing of 1310 nm inasgaas quantum dot lasers by facet coating.pdf: 391400 bytes, checksum: e58506e581d2b497a385d9136eccd125 (md5) previous issue date: 2010; 其它
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-05-24
源URL[http://ir.semi.ac.cn/handle/172111/11244]  
专题半导体研究所_中科院半导体材料科学重点实验室
推荐引用方式
GB/T 7714
Cao YL ,Yang T ,Xu PF ,et al. Delay of the excited state lasing of 1310 nm InAs/GaAs quantum dot lasers by facet coating[J]. applied physics letters,2010,96(17):art. no. 171101.
APA Cao YL .,Yang T .,Xu PF .,Ji HM .,Gu YX .,...&Chen LH .(2010).Delay of the excited state lasing of 1310 nm InAs/GaAs quantum dot lasers by facet coating.applied physics letters,96(17),art. no. 171101.
MLA Cao YL ,et al."Delay of the excited state lasing of 1310 nm InAs/GaAs quantum dot lasers by facet coating".applied physics letters 96.17(2010):art. no. 171101.

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来源:半导体研究所

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