Characteristics of high-purity Cu thin films deposited on polyimide by radiofrequency Ar/H2 atmospheric-pressure plasma jet
文献类型：期刊论文
| 作者 | P. Zhao ; W. Zheng ; Y. D. Meng ; and M. Nagatsu |
| 刊名 | journal of applied physics
 |
| 出版日期 | 2013 |
| 卷号 | 113 |
| 学科主题 | 等离子体物理 |
| 公开日期 | 2013-08-21 |
| 源URL | [http://ir.hfcas.ac.cn/handle/334002/10358]  |
| 专题 | 合肥物质科学研究院_中科院等离子体物理研究所 |
| 推荐引用方式 GB/T 7714 | P. Zhao,W. Zheng,Y. D. Meng,et al. Characteristics of high-purity Cu thin films deposited on polyimide by radiofrequency Ar/H2 atmospheric-pressure plasma jet[J]. journal of applied physics,2013,113. |
| APA | P. Zhao,W. Zheng,Y. D. Meng,&and M. Nagatsu.(2013).Characteristics of high-purity Cu thin films deposited on polyimide by radiofrequency Ar/H2 atmospheric-pressure plasma jet.journal of applied physics,113. |
| MLA | P. Zhao,et al."Characteristics of high-purity Cu thin films deposited on polyimide by radiofrequency Ar/H2 atmospheric-pressure plasma jet".journal of applied physics 113(2013). |
入库方式： OAI收割
来源：合肥物质科学研究院
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。