A Breakdown Criterion of Free Molecular Flows and an Optimum Analysis of EBPVD
文献类型：会议论文
| 作者 | Li SH(李帅辉) ; Fan J(樊菁); Shu YH(舒勇华); Li SH
|
| 出版日期 | 2009 |
| 会议名称 | 26th International Symposium on Rarefied Gas Dynmaics (RGD26) |
| 会议日期 | JUN 20-JUL 25, 2008 |
| 会议地点 | Kyoto, JAPAN |
| 关键词 | Free Molecular Assumption Breakdown Criterion Optimization Thin Film Ebpvd Physical Vapor-Deposition Yttrium |
| 页码 | 1105-1110 |
| 通讯作者 | Li SH |
| 中文摘要 | Two important issues in electron beam physical vapor deposition (EBPVD) are addressed. The first issue is a validity condition of the classical cosine law widely used in the engineering context. This requires a breakdown criterion of the free molecular assumption on which the cosine law is established. Using the analytical solution of free molecular effusion flow, the number of collisions (N-c) for a particle moving from an evaporative source to a substrate is estimated that is proven inversely proportional to the local Knudsen number at the evaporation surface. N-c = 1 is adopted as a breakdown criterion of the free molecular assumption, and it is verified by experimental data and DSMC results. The second issue is how to realize the uniform distributions of thickness and component over a large-area thin film. Our analysis shows that at relatively low evaporation rates the goal is easy achieved through arranging the evaporative source positions properly and rotating the substrate. |
| 收录类别 | CPCI-S |
| 会议录 | Rarefied Gas Dynamics
 |
| 会议录出版者 | Melville |
| 会议录出版地 | Amer Inst Physics |
| 语种 | 英语 |
| ISSN号 | 0094-243X/978-0-7354-0615-5 |
| WOS记录号 | WOS:000265564800177 |
| 源URL | [http://dspace.imech.ac.cn/handle/311007/25362]  |
| 专题 | 力学研究所_高温气体动力学国家重点实验室 |
| 通讯作者 | Li SH |
| 推荐引用方式 GB/T 7714 | Li SH,Fan J,Shu YH,et al. A Breakdown Criterion of Free Molecular Flows and an Optimum Analysis of EBPVD[C]. 见:26th International Symposium on Rarefied Gas Dynmaics (RGD26). Kyoto, JAPAN. JUN 20-JUL 25, 2008. |
入库方式： OAI收割
来源：力学研究所
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