Holographic surface mask etching and optical structures
文献类型：专利
| 作者 | FAINMAN, YESHAIAHU; NAKAGAWA, WATARU; CHEN, CHYONG-HUA; SUN, PANG-CHEN; PANG, LIN |
| 专利号 | WO2004010167A3 |
| 著作权人 | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
| 国家 | 世界知识产权组织 |
| 文献子类 | 发明申请 |
| 其他题名 | Holographic surface mask etching and optical structures |
| 英文摘要 | The invention is directed to a method for etching a solid state material to create a surface relief pattern. A resist layer is formed on the surface of the solid state material. The photoresist layer is holographically patterned to form a patterned mask. The pattern is then transferred into the solid state material by a dry etching process. The invention is especially useful for forming optical nanostructures. In preferred embodiments, a direct write process, such as e-beam lithography, is used to define defects and functional elements, such as waveguides and cavities. |
| 公开日期 | 2004-01-29 |
| 申请日期 | 2003-07-18 |
| 状态 | 未确认 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/43462]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
| 推荐引用方式 GB/T 7714 | FAINMAN, YESHAIAHU,NAKAGAWA, WATARU,CHEN, CHYONG-HUA,et al. Holographic surface mask etching and optical structures. WO2004010167A3. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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