中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Layer growth using metal film and/or islands

文献类型:专利

作者GASKA, REMIGIJUS; ZHANG, JIANGPING; SHUR, MICHAEL
专利号WO2007002028A3
著作权人SENSOR ELECTRONIC TECHNOLOGY, INC.
国家世界知识产权组织
文献子类发明申请
其他题名Layer growth using metal film and/or islands
英文摘要A solution for manufacturing a nitride-based heterostructure, semiconductor; device, or the like, by growing one or more layers using a metal film and/or nitride islands is provided. In an embodiment of the invention, a group-Ill nitride film is grown on a surface of a lower layer. The nitride film is grown by first epitaxially growing a group-Ill metal film on the surface in a substantially nitrogen-free atmosphere. The group-Ill metal film is grown such that it covers substantially an entire area of the surface. Next, the group-Ill metal film is nitridated to form a group-Ill nitride film. This process can be repeated one or more times to form the layer. In another embodiment of the invention, islands are formed on a surface of a lower layer from a group-Ill nitride film. The islands can be used to subsequent group-Ill nitride growth to form the group-Ill nitride layer. The invention provides an improved solution for growing a layer that can be used to generate heterostructures/semiconductors/devices having improved characteristics.
公开日期2007-12-13
申请日期2006-06-20
状态未确认
源URL[http://ir.opt.ac.cn/handle/181661/43530]  
专题半导体激光器专利数据库
作者单位SENSOR ELECTRONIC TECHNOLOGY, INC.
推荐引用方式
GB/T 7714
GASKA, REMIGIJUS,ZHANG, JIANGPING,SHUR, MICHAEL. Layer growth using metal film and/or islands. WO2007002028A3.

入库方式: OAI收割

来源:西安光学精密机械研究所

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