中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
METHOD FOR DEPOSITION OF (Al,In,Ga,B)N

文献类型:专利

作者IZA, MICHAEL; DENBAARS, STEVEN P.; NAKAMURA, SHUJI
专利号US20080251802A1
著作权人THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
国家美国
文献子类发明申请
其他题名METHOD FOR DEPOSITION OF (Al,In,Ga,B)N
英文摘要A method for growing an improved quality nitride thin film on a patterned substrate is disclosed, wherein the nitride film is grown at atmospheric pressure. A nitride template is disclosed, comprising a patterned substrate and a one or more nitride layer direct growth off of the patterned substrate, comprising no lateral epitaxial overgrowth regions and a substantially coalesced surface smooth enough for subsequent deposition of light emitting device quality nitride layers onto the surface. A light emitting diode comprising the nitride film is also disclosed.
公开日期2008-10-16
申请日期2008-04-14
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/43571]  
专题半导体激光器专利数据库
作者单位THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
推荐引用方式
GB/T 7714
IZA, MICHAEL,DENBAARS, STEVEN P.,NAKAMURA, SHUJI. METHOD FOR DEPOSITION OF (Al,In,Ga,B)N. US20080251802A1.

入库方式: OAI收割

来源:西安光学精密机械研究所

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