Etched-facet semiconductor optical component with integrated end-coupled waveguide and methods of fabrication and use thereof
文献类型：专利
| 作者 | BLAUVELT, HENRY A.; VEMOOY, DAVID W.; PASLASKI, JOEL S.; GROSJEAN, CHARLES I.; LEE, HAO; MONZON, FRANKLIN G.; NGUYEN, KATRINA H. |
| 专利号 | US20090304326A1 |
| 著作权人 | HUAWEI TECHNOLOGIES CO., LTD. |
| 国家 | 美国 |
| 文献子类 | 发明申请 |
| 其他题名 | Etched-facet semiconductor optical component with integrated end-coupled waveguide and methods of fabrication and use thereof |
| 英文摘要 | An optical apparatus comprises: a semiconductor substrate; a semiconductor optical device integrally formed on the substrate and having an off-normal device end face; and a low-index planar optical waveguide integrally formed on the semiconductor substrate at the device end face. The device and waveguide are non-collinear, and the waveguide is end-coupled at its proximal end to the optical device by refraction at the device end face. The apparatus further includes a reflective coating between the waveguide and substrate, an etched end face curved in the horizontal dimension, or an etched end face with a lower portion that protrudes beneath a proximal portion of the waveguide. |
| 公开日期 | 2009-12-10 |
| 申请日期 | 2009-08-15 |
| 状态 | 授权 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/43586]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | HUAWEI TECHNOLOGIES CO., LTD. |
| 推荐引用方式 GB/T 7714 | BLAUVELT, HENRY A.,VEMOOY, DAVID W.,PASLASKI, JOEL S.,et al. Etched-facet semiconductor optical component with integrated end-coupled waveguide and methods of fabrication and use thereof. US20090304326A1. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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