中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Junction type semiconductor light emitting element

文献类型:专利

作者TANIGUCHI KOICHI; ITO AKIRA; HATTORI KUNIHIRO
专利号JP1989179388A
著作权人RES DEV CORP OF JAPAN
国家日本
文献子类发明申请
其他题名Junction type semiconductor light emitting element
英文摘要PURPOSE:To massproduce elements at a low cost and make the modification of active layer's forms relatively simple, by forming a groove in such a way that a diffraction grating is exposed at an insulation layer on the diffraction grating that is formed on a semiconductor substrate and forming the semiconductor layer comprising the active layer on the insulation layer so that its semiconductor layer may cover the above groove. CONSTITUTION:An n-type InP clad layer 1 performs an epitaxial growth on an n-type InP substrate B and a diffraction grating 2 is formed on a clad layer After that, an insulation layer 3 is provided and a slender groove 7 which causes the clad layer 1 extending from one end of the substrate to its other end to be exposed is formed at the insulation layer 3. Subsequently, an InPGaAsP active layer 4 and a p-type InP clad layer 5 perform the epitaxial growth in order in such a way that its growth may cover the groove 7 and a semiconductor layer having a double hetero junction is formed on the insulation layer 3. An electrode E1 as an electrode material located at the p-side of the substrate is mounted at the surface of the clad layer 5 as well as the insulation layer 3 and the electrode E2 as the electrode material located at the n-side of the substrate is mounted at the lower face of the substrate layer B respectively. Finally both end faces of the semiconductor layer are cleft to obtain cleavage planes and resonators are formed by using the cleavage planes as reflecting mirrors.
公开日期1989-07-17
申请日期1988-01-05
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/44014]  
专题半导体激光器专利数据库
作者单位RES DEV CORP OF JAPAN
推荐引用方式
GB/T 7714
TANIGUCHI KOICHI,ITO AKIRA,HATTORI KUNIHIRO. Junction type semiconductor light emitting element. JP1989179388A.

入库方式: OAI收割

来源:西安光学精密机械研究所

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