Patterned mirror VCSEL with adjustable selective etch region
文献类型：专利
| 作者 | GRODZINSKI, PIOTR; LEBBY, MICHAEL S.; LEE, HSING-CHUNG |
| 发表日期 | 1996-09-17 |
| 专利号 | US5557626 |
| 著作权人 | FINISAR CORPORATION |
| 国家 | 美国 |
| 文献子类 | 授权发明 |
| 其他题名 | Patterned mirror VCSEL with adjustable selective etch region |
| 英文摘要 | Patterned-mirrors for VCSELs are fabricated by forming a first mirror stack of a plurality of pairs of relatively high and low index of refraction layers, forming an active region of aluminum-free material on the first mirror stack, and forming a second mirror stack of a plurality of pairs of relatively high and low index of refraction layers. The second mirror stack includes first and second portions of materials selected to provide different rates of etching between the first and second portions. The second portion is selectively etched to the first portion by utilizing the first portion as an etch stop. |
| 公开日期 | 1996-09-17 |
| 申请日期 | 1994-06-15 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/44292]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | FINISAR CORPORATION |
| 推荐引用方式 GB/T 7714 | GRODZINSKI, PIOTR,LEBBY, MICHAEL S.,LEE, HSING-CHUNG. Patterned mirror VCSEL with adjustable selective etch region. US5557626. 1996-09-17. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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