中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Multi quantum well grinsch detector

文献类型:专利

作者RAZEGHI, MANIJEH
发表日期2002-10-01
专利号US6459096
著作权人MP TECHNOLOGIES LLC
国家美国
文献子类授权发明
其他题名Multi quantum well grinsch detector
英文摘要A p-i-n structure for use in photo laser diodes is disclosed, being formed of an GaxIn1-xN/GaN alloy (X=0->1). In the method of the subject invention, buffer layers of GaN are grown on a substrate and then doped. The active, confinement and confinement layers of p-type material are next grown and doped, if desired. The structure is masked and etched as required to expose a surface which is annealed. A p-type surface contact is formed on this annealed surface so as to be of sufficiently low resistance as to provide good quality performance for use in a device.
公开日期2002-10-01
申请日期2000-03-15
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/44486]  
专题半导体激光器专利数据库
作者单位MP TECHNOLOGIES LLC
推荐引用方式
GB/T 7714
RAZEGHI, MANIJEH. Multi quantum well grinsch detector. US6459096. 2002-10-01.

入库方式: OAI收割

来源:西安光学精密机械研究所

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