中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Method of manufacturing semiconductor optical device

文献类型:专利

作者PARK, KYUNG HYUN; BAEK, YONG SOON; KIM, SUNG BOCK; OH, KWANG RYONG
发表日期2003-07-15
专利号US6593162
著作权人ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
国家美国
文献子类授权发明
其他题名Method of manufacturing semiconductor optical device
英文摘要The present invention relates to a method of manufacturing a semiconductor optical device. The present invention discloses a method of manufacturing an optical device of a planar buried heterostructure (PBH) type by which an active layer region of a taper shape at both ends is patterned, an undoped InP layer is selectively grown in order to reduce the propagation loss and two waveguides are simultaneously formed by means of a self-aligned method, thus simplifying the process to increase repeatability and yield.
公开日期2003-07-15
申请日期2002-06-27
状态授权
源URL[http://ir.opt.ac.cn/handle/181661/44512]  
专题半导体激光器专利数据库
作者单位ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
推荐引用方式
GB/T 7714
PARK, KYUNG HYUN,BAEK, YONG SOON,KIM, SUNG BOCK,et al. Method of manufacturing semiconductor optical device. US6593162. 2003-07-15.

入库方式: OAI收割

来源:西安光学精密机械研究所

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