中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Photoluminescence method of testing double heterostructure wafers

文献类型:专利

作者BESOMI PAUL RAYMOND; DEGANI JOSHUA; WILT DANIEL PAUL
发表日期1987-04-16
专利号DE3370191D1
著作权人WESTERN ELECTRIC COMPANY INCORPORATED
国家德国
文献子类授权发明
其他题名Photoluminescence method of testing double heterostructure wafers
英文摘要Under photoluminescence (PL) excitation, the lateral spreading of photo-excited carriers can suppress the photoluminescence signal from double heterostructure (DH) wafers containing a p-n junction. In any DH with a p-n junction in the active layer, PL is suppressed if the power of the excitation source does not exceed a threshold value. This effect can be advantageously used for a nondestructive optical determination of the top cladding layer sheet conductance as well as p-n junction misplacement, important parameters for injection lasers and LEDs.
公开日期1987-04-16
申请日期1983-08-17
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/44614]  
专题半导体激光器专利数据库
作者单位WESTERN ELECTRIC COMPANY INCORPORATED
推荐引用方式
GB/T 7714
BESOMI PAUL RAYMOND,DEGANI JOSHUA,WILT DANIEL PAUL. Photoluminescence method of testing double heterostructure wafers. DE3370191D1. 1987-04-16.

入库方式: OAI收割

来源:西安光学精密机械研究所

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