中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Production of semiconductor devices

文献类型:专利

作者HOUGHTON, ANDREW J. N.
发表日期1987-03-03
专利号US4647339
著作权人BRITISH TELECOMMUNICATIONS PUBLIC LIMITED COMPANY BRITISH TELECOM CENTRE A BRITISH COMPANY
国家美国
文献子类授权发明
其他题名Production of semiconductor devices
英文摘要Onto the surface of an initial semiconductor structure 1, 2, 3, 4 is deposited a layer of an organic material 5 having a window 9. Layers 6', 7', and 8' are deposited on the exposed surface of the semiconductor, of which 8' is an ion-beam resisting material. Corresponding layers 6, 7, and 8 are deposited on the organic material. The organic material is then lifted off together with layers 6, 7, and 8. Ion-beam milling of the semiconductor material to either side of 8' followed by removal of any remnant of 8' results in a structure having an elevated semiconductor portion carrying an electrode 6', 7'. Preferred materials are gallium arsenide for layers 1 and 3, gallium aluminium arsenides for layers 2 and 4, titanium for layers 6' and 8', and gold for layer 7'. The invention can be applied to the production of rib waveguide electrooptic devices, including phase modulators.
公开日期1987-03-03
申请日期1985-05-21
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/44642]  
专题半导体激光器专利数据库
作者单位BRITISH TELECOMMUNICATIONS PUBLIC LIMITED COMPANY BRITISH TELECOM CENTRE A BRITISH COMPANY
推荐引用方式
GB/T 7714
HOUGHTON, ANDREW J. N.. Production of semiconductor devices. US4647339. 1987-03-03.

入库方式: OAI收割

来源:西安光学精密机械研究所

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