Semiconductor wafer testing method and apparatus
文献类型：专利
| 作者 | KUCHTA, DANIEL M. |
| 发表日期 | 1999-04-06 |
| 专利号 | US5891746 |
| 著作权人 | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 国家 | 美国 |
| 文献子类 | 授权发明 |
| 其他题名 | Semiconductor wafer testing method and apparatus |
| 英文摘要 | The present invention is a structure and method to reduce the inductance of the AC test signal path used for testing an electrical device contained within a semiconductor wafer. This extends the frequency range of testing. It enables testing the device's performance characteristics at higher frequencies than otherwise useable. It is particularly directed for testing on-wafer VCSELs. The method provides to the electrical device the characteristics of a microwave bias-tee device. An on wafer capacitor is designed into the environment of the electrical device enabling the formation and use of the three ports of a bias-tee. Preferably, the bias-tee is formed in a manner not requiring the addition of processing steps to the wafer manufacturing process. The method further provides a way to increase the capacitance of the on-wafer capacitor. |
| 公开日期 | 1999-04-06 |
| 申请日期 | 1998-03-10 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/45036]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 推荐引用方式 GB/T 7714 | KUCHTA, DANIEL M.. Semiconductor wafer testing method and apparatus. US5891746. 1999-04-06. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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