System for adjusting the wavelength light output of a semiconductor device using hydrogenation
文献类型：专利
| 作者 | CHUA, CHRISTOPHER L.; KNEISSL, MICHAEL A.; JOHNSON, NOBLE M.; KIESEL, PETER |
| 发表日期 | 2010-07-27 |
| 专利号 | US7764721 |
| 著作权人 | PALO ALTO RESEARCH CENTER INCORPORATED |
| 国家 | 美国 |
| 文献子类 | 授权发明 |
| 其他题名 | System for adjusting the wavelength light output of a semiconductor device using hydrogenation |
| 英文摘要 | A method and structure for adjusting the wavelength output of a semiconductor device is described. In the method, the hydrogen concentration in an active region of the semiconductor device is adjusted either during fabrication or after the device has been fabricated. The adjustment provides a simple technique for fine tuning many device types including regular lasers and VCSEL structures. The adjustment also allows for mass production of lasers of many different frequencies on a single wafer substrate, a system particularly desirable for wavelength division multiplexing systems. |
| 公开日期 | 2010-07-27 |
| 申请日期 | 2005-12-15 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/45047]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | PALO ALTO RESEARCH CENTER INCORPORATED |
| 推荐引用方式 GB/T 7714 | CHUA, CHRISTOPHER L.,KNEISSL, MICHAEL A.,JOHNSON, NOBLE M.,et al. System for adjusting the wavelength light output of a semiconductor device using hydrogenation. US7764721. 2010-07-27. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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