An automatic imaging spectroscopic ellipsometer for characterization of nano-film pattern on solid substrate
文献类型:会议论文
作者 | Meng YH(孟永宏)![]() ![]() ![]() ![]() ![]() |
出版日期 | 2008 |
会议名称 | 4th International Conference on Spectroscopic Ellipsometry (ICSE-4) |
会议日期 | JUN 11-15, 2007 |
会议地点 | Stockholm, SWEDEN |
页码 | 1050-1053 |
通讯作者 | Jin G |
中文摘要 | In order to characterize the physical and spatial properties of nano-film pattern on solid substrates, an automatic imaging spectroscopic ellipsometer (ISE) based on a polarizer - compensator - specimen - analyzer configuration in the visible region is presented. It can provide the spectroscopic ellipsometric parameters psi (x, y, lambda) and Delta (x, y, lambda) of a large area specimen with a lateral resolution in the order of some microns. A SiO2 stepped layers pattern is used to demonstrate the function of the ISE which shows potential application in thin film devices' such as high-throughput bio-chips. |
收录类别 | CPCI-S ; EI |
会议录 | Physica Status Solidi C - Current Topics In Solid State Physics, Vol 5, No 5
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会议录出版者 | Weinheim |
会议录出版地 | Wiley-V C H Verlag Gmbh |
语种 | 英语 |
ISSN号 | 1610-1634 |
WOS记录号 | WOS:000256862500012 |
源URL | [http://dspace.imech.ac.cn/handle/311007/25420] ![]() |
专题 | 力学研究所_力学所知识产出(1956-2008) |
通讯作者 | Jin G |
推荐引用方式 GB/T 7714 | Meng YH,Chen YY,Qi C,et al. An automatic imaging spectroscopic ellipsometer for characterization of nano-film pattern on solid substrate[C]. 见:4th International Conference on Spectroscopic Ellipsometry (ICSE-4). Stockholm, SWEDEN. JUN 11-15, 2007. |
入库方式: OAI收割
来源:力学研究所
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