Method and apparatus for reducing specular reflections in semiconductor lasers
文献类型：专利
| 作者 | HWANG, WEN-YEN; MURRY, STEFAN J. |
| 发表日期 | 2006-03-07 |
| 专利号 | US7010012 |
| 著作权人 | APPLIED OPTOELECTRONICS, INC. |
| 国家 | 美国 |
| 文献子类 | 授权发明 |
| 其他题名 | Method and apparatus for reducing specular reflections in semiconductor lasers |
| 英文摘要 | The present invention is directed a method of fabricating a VCSEL. First, a substrate with a back surface and a front surface is provided. Then, a first reflector, an active region, and a second reflector are disposed on the front surface. The first reflector is disposed on the front surface. The active region is interposed between the first reflector and the second reflector. Then, anti-reflection features are formed into the back surface of the substrate to reduce specular reflection of light into the active region. |
| 公开日期 | 2006-03-07 |
| 申请日期 | 2001-07-26 |
| 状态 | 授权 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/45126]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | APPLIED OPTOELECTRONICS, INC. |
| 推荐引用方式 GB/T 7714 | HWANG, WEN-YEN,MURRY, STEFAN J.. Method and apparatus for reducing specular reflections in semiconductor lasers. US7010012. 2006-03-07. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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