中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Selective growth mask,fabricating method of semiconductor optical device,and semiconductor optical device

文献类型:专利

作者TAKUSHI, ITAGAKI; TOHRU, TAKIGUCHI; YUTAKA, MIHASHI; AKIRA, TAKEMOTO; TAKUSHI, , ITAGAKI; TOHRU, , TAKIGUCHI; YUTAKA, , MIHASHI; AKIRA, , TAKEMOTO
发表日期1997-04-02
专利号GB2300516B
著作权人MITSUBISHI DENKI KABUSHIKI KAISHA
国家英国
文献子类授权发明
其他题名Selective growth mask,fabricating method of semiconductor optical device,and semiconductor optical device
英文摘要A selective growth mask used for forming a semiconductor layer constituting a stripe shaped waveguide disposed connecting the resonator facets of a semiconductor optical device which has integrated a laser diode and optical waveguide lens continuously in the resonator length direction (10) between a pair of resonator facets by selective region growth, comprises: a pair of dielectric material films (2a, 2b) disposed on a surface of a substrate (1) on which a semiconductor layer constituting the optical waveguide is grown, having a plan view configuration of linear symmetry against a supposed line extending in the resonator length direction (10) on the substrate surface (1); opposing edges of the dielectric films (2a, 2b) being parallel with the supposed line; ; the widths in the direction perpendicular to the resonator length direction (10) of the dielectric films (2a, 2b) both becoming gradually narrower toward the ends in the resonator length direction (10) of the films (2a, 2b) from a predetermined position in the resonator length direction (10) of the films (2a, 2b). Therefore, the design of a mask pattern which can perform precise layer thickness profile control can be easily performed.
公开日期1997-04-02
申请日期1996-04-19
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/45757]  
专题半导体激光器专利数据库
作者单位MITSUBISHI DENKI KABUSHIKI KAISHA
推荐引用方式
GB/T 7714
TAKUSHI, ITAGAKI,TOHRU, TAKIGUCHI,YUTAKA, MIHASHI,et al. Selective growth mask,fabricating method of semiconductor optical device,and semiconductor optical device. GB2300516B. 1997-04-02.

入库方式: OAI收割

来源:西安光学精密机械研究所

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