中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Compound semiconductor devices and methods of making compound semiconductor devices

文献类型:专利

作者ISHIKAWA, MASAYUKI; NISHIKAWA, YUKIE; ONOMURA, MASAAKI; SAITO, SHINJI; PARBROOK, PETER J.; HATAKOSHI, GENICHI
发表日期1996-12-17
专利号US5585649
著作权人KABUSHIKI KAISHA TOSHIBA
国家美国
文献子类授权发明
其他题名Compound semiconductor devices and methods of making compound semiconductor devices
英文摘要A compound semiconductor device with an improved internal current blocking structure. The semiconductor device includes an n-clad layer of II-VI compound semiconductor, a p-clad layer of II-VI compound semiconductor, an active layer of II-VI compound semiconductor between the n-clad and p-clad layers, a very thin current blocking layer of n-type II-VI compound semiconductor on the p-clad layer and providing an opening, a p-contact layer of p-type II-VI compound semiconductor on the p-clad layer and the current blocking layer at the opening, and a p-side electrode on the p-contact layer.
公开日期1996-12-17
申请日期1995-03-14
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/45814]  
专题半导体激光器专利数据库
作者单位KABUSHIKI KAISHA TOSHIBA
推荐引用方式
GB/T 7714
ISHIKAWA, MASAYUKI,NISHIKAWA, YUKIE,ONOMURA, MASAAKI,et al. Compound semiconductor devices and methods of making compound semiconductor devices. US5585649. 1996-12-17.

入库方式: OAI收割

来源:西安光学精密机械研究所

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