中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor laser and method for manufacturing semiconductor laser

文献类型:专利

作者MORI, KENZO; KIMURA, TADASHI; YOSHITATU, KAWAMA; NOBUAKI, KANENO; TATUYA, KIMURA; YUJI, OKURA; HITOSHI, TADA
发表日期1997-01-08
专利号GB2267602B
著作权人MITSUBISHI DENKI KABUSHIKI KAISHA
国家英国
文献子类授权发明
其他题名Semiconductor laser and method for manufacturing semiconductor laser
英文摘要The laser includes a first conductivity type semiconductor substrate (1); a double-heterojunction structure including a first conductivity type cladding layer (2), an active layer (3), and a second conductivity type cladding layer (4) successively disposed on the semiconductor substrate (1); two parallel grooves for forming the double heterojunction structure in a mesa stripe; a first conductivity type layer (5). a second conductivity type current blocking layer (6), and a first conductivity type current blocking layer (7) successively disposed on the semiconductor substrate (1) and contacting opposite sides of the mesa; and impurity doped regions (13) formed by adding an impurity from the surface of the first conductivity type current blocking layer (7).; The impurity doped regions (13) electrically separate an upper part of the mesa from the second conductivity type current blocking layer (6) at opposite sides of the mesa. Since the second conductivity type current blocking layer (6) is not in contact with the mesa structure, no leakage current path is formed in the laser structure.
公开日期1997-01-08
申请日期1993-05-14
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/46080]  
专题半导体激光器专利数据库
作者单位MITSUBISHI DENKI KABUSHIKI KAISHA
推荐引用方式
GB/T 7714
MORI, KENZO,KIMURA, TADASHI,YOSHITATU, KAWAMA,et al. Semiconductor laser and method for manufacturing semiconductor laser. GB2267602B. 1997-01-08.

入库方式: OAI收割

来源:西安光学精密机械研究所

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