Hybrid optical IC with optical axes at different level
文献类型：专利
| 作者 | TABUCHI, HARUHIKO, C/O FUJITSU LIMITED |
| 发表日期 | 1999-09-15 |
| 专利号 | EP0642045B1 |
| 著作权人 | FUJITSU LIMITED |
| 国家 | 欧洲专利局 |
| 文献子类 | 授权发明 |
| 其他题名 | Hybrid optical IC with optical axes at different level |
| 英文摘要 | There is disclosed an integrated optical device comprising: a silicon substrate (1) having a surface; a planar optical waveguide (20) which is formed partially on said silicon substrate (1), and has a light guiding core region (4) of high refractive index surrounded by a lower-index cladding layer (2,3) and a flat top surface; a bonding pedestal (20a) which is formed partially on said silicon substrate occupying a portion different from the portion occupying said planar optical waveguide and has a flat top surface, the heights of said top flat surface of said bonding pedestal (20a) and said planar optical waveguide (20) from the surface of said silicon substrate being the same; an edge input/output type optical semiconductor device (8) bonded on said top flat surface of said bonding pedestal (20a), said edge input/output type optical semiconductor device being mounted on an imaginary line extending from a light input/output end of said planar optical waveguide so that said edge input/output type optical semiconductor device align with said planar optical waveguide, levels of the optical axes of said planar optical waveguide and said edge input/output type optical semiconductor device from the surface of said silicon substrate being different; and means for changing level of an optical axis (10,11,12) for optically coupling said planar optical waveguide and said edge input/output type optical semiconductor device through changing height of optical axis relative to the surface of said silicon substrate. There is also disclosed a manufacturing method for the device comprising the steps of: forming an optical fiber guide groove and first and second lens guiding grooves for position-aligning lenses by selectively etching the surface of a silicon substrate through anisotropic etching; bonding another silicon substrate having a planarizing layer formed on the surface of said other silicon substrate to said silicon substrate, by directing said cover layer to the surface of said silicon substrate; removing said other silicon substrate and leaving said planarizing layer; forming a deposited layer (20b) for planar optical waveguide by depositing lower cladding layer material and material for core region on said planarizing layer, by patterning said deposited materials for core region through photolithography and by depositing upper cladding layer material; forming bonding pads (17) for bonding an optical semiconductor device (8) at a place corresponding to said bonding pedestal on said top surface of said deposited layer (20b) for planar optical waveguide; selectively removing said optical waveguide and said planarizing layer and exposing said V groove and said first and second lens guiding grooves; and forming a optical member guide groove (13) suitable for position-aligning a optical member (12) for shifting the levels of optical axes, on the surface of said silicon substrate between said first and second lens guiding grooves. |
| 公开日期 | 1999-09-15 |
| 申请日期 | 1994-05-27 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/47299]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | FUJITSU LIMITED |
| 推荐引用方式 GB/T 7714 | TABUCHI, HARUHIKO, C/O FUJITSU LIMITED. Hybrid optical IC with optical axes at different level. EP0642045B1. 1999-09-15. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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