Halbleiterlaser und dazugehöriges Herstellungsverfahren
文献类型：专利
| 作者 | IKOMA NOBUYUKI |
| 发表日期 | 2001-09-20 |
| 专利号 | DE69801342D1 |
| 著作权人 | SUMITOMO ELECTRIC INDUSTRIES,LTD. |
| 国家 | 德国 |
| 文献子类 | 授权发明 |
| 其他题名 | Halbleiterlaser und dazugehöriges Herstellungsverfahren |
| 英文摘要 | The present invention relates to a semiconductor laser equipped with a novel window structure, thereby realizing higher output, and a method of making the same. The method is a method of making a semiconductor laser having a window structure transparent to emitted laser light. In particular, into a laminate structure comprising a semiconductor substrate, a lower cladding layer, an active layer, and an upper cladding layer, impurity atoms is implanted to a predetermined region of the upper cladding layer by ion implantation method, thereby forming an impurity implanted region above the active layer. Further, in this method, after the laminate structure is heat-treated to such an extent that the impurity atom fails to reach the active layer, the laminate structure is cleaved in the area where the impurity atom is implanted, thus yielding a semiconductor laser. As a result of such a heat treatment, the vacancies generated upon ion implantation diffuse into the active layer, whereas the impurity atoms themselves do not diffuse into the active layer. This vacancy diffusion forms, in the vicinity of the cleavage plane in the active layer, a window structure in which a well layer and barrier layers which constitute the quantum well structure are selectively interdiffused. This window structure suppresses the catastrophic optical damage during high output operation. |
| 公开日期 | 2001-09-20 |
| 申请日期 | 1998-01-05 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/47311]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | SUMITOMO ELECTRIC INDUSTRIES,LTD. |
| 推荐引用方式 GB/T 7714 | IKOMA NOBUYUKI. Halbleiterlaser und dazugehöriges Herstellungsverfahren. DE69801342D1. 2001-09-20. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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