中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor light emitting device and fabrication method for semiconductor light emitting device

文献类型:专利

作者HATORI, NOBUAKI; YAMAMOTO, TSUYOSHI; SUDO, HISAO; ARAKAWA, YASUHIKO
发表日期2013-07-09
专利号US8483252
著作权人FUJITSU LIMITED
国家美国
文献子类授权发明
其他题名Semiconductor light emitting device and fabrication method for semiconductor light emitting device
英文摘要A semiconductor light emitting device includes a lower cladding layer, an active layer, and an AlGaAs upper cladding layer mounted on a GaAs substrate. The semiconductor light emitting device has a ridge structure including the AlGaAs upper cladding layer. The semiconductor light emitting device further includes an InGaAs etching stop layer provided in contact with the lower side of the AlGaAs upper cladding layer. The InGaAs etching stop layer has a band gap greater than that of the active layer.
公开日期2013-07-09
申请日期2008-03-19
状态授权
源URL[http://ir.opt.ac.cn/handle/181661/47462]  
专题半导体激光器专利数据库
作者单位FUJITSU LIMITED
推荐引用方式
GB/T 7714
HATORI, NOBUAKI,YAMAMOTO, TSUYOSHI,SUDO, HISAO,et al. Semiconductor light emitting device and fabrication method for semiconductor light emitting device. US8483252. 2013-07-09.

入库方式: OAI收割

来源:西安光学精密机械研究所

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