中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Method of making a VCSEL with passivation

文献类型:专利

作者GRODZINSKI, PIOTR; LEBBY, MICHAEL S.
发表日期1997-08-26
专利号US5661075
著作权人FINISAR CORPORATION
国家美国
文献子类授权发明
其他题名Method of making a VCSEL with passivation
英文摘要A substrate (103) having a first stack of DBRs (106), an active region (118), and a second stack of DBRs (138) is provided. An etch mask (146) is formed on the second stack of DBRs (138) and etched. The second stack of DBRs (138), the active region (118), and a portion of the first stack of DBRs (106) are subsequently etched. A portion of the etch mask (146) is removed from the etch mask (146). A material layer (202, 302) is then selectively deposited on portions of the second stack of DBRs (138), the active region (118), and the first stack of DBRs (106) by either selective epitaxial over-growth or mass-transfer processes, thereby passivating the VCSEL (101).
公开日期1997-08-26
申请日期1995-02-06
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/49013]  
专题半导体激光器专利数据库
作者单位FINISAR CORPORATION
推荐引用方式
GB/T 7714
GRODZINSKI, PIOTR,LEBBY, MICHAEL S.. Method of making a VCSEL with passivation. US5661075. 1997-08-26.

入库方式: OAI收割

来源:西安光学精密机械研究所

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