中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Integrated semiconductor devices and method for manufacture thereof

文献类型:专利

作者GOOSSEN, KEITH WAYNE
发表日期1994-12-28
专利号EP0631317A2
著作权人AT&T CORP.
国家欧洲专利局
文献子类发明申请
其他题名Integrated semiconductor devices and method for manufacture thereof
英文摘要An integrated semiconductor device is formed by bonding the conductors (CI1, CI2) of one fabricated semiconductor device (SD) having a substrate (SIS) to the conductors (COI1,COI2) on another fabricated semiconductor device (MOD) having a substrate (SUB), flowing an etch-resist (PH) in the form of a photoresist between the devices, allowing the etch-resist to dry, and removing the substrate (SUB) from one of the semiconductor devices. Preferably the etch-resist is retained to impart mechanical strength to the device. More specifically, a hybrid semiconductor device is formed by bonding the conductors of one or more GaAs/AlGaAs multiple quantum well modulators to conductors on an IC chip, flowing a photoresist between the modulators and the chip, allowing the photoresist to dry, and removing the substrate from the modulator.
公开日期1994-12-28
申请日期1994-06-15
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/50895]  
专题半导体激光器专利数据库
作者单位AT&T CORP.
推荐引用方式
GB/T 7714
GOOSSEN, KEITH WAYNE. Integrated semiconductor devices and method for manufacture thereof. EP0631317A2. 1994-12-28.

入库方式: OAI收割

来源:西安光学精密机械研究所

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