Optische halfgeleiderinrichtingen en werkwijze voor het maken daarvan.
文献类型：专利
| 作者 | TOHRU TAKIGUCHI; KATSUHIKO GOTO; HIROTAKA KIZUKI |
| 发表日期 | 1995-02-16 |
| 专利号 | NL9401192A |
| 著作权人 | MITSUBISHI DENKI KABUSHIKI KAISHA |
| 国家 | 荷兰 |
| 文献子类 | 发明申请 |
| 其他题名 | Optische halfgeleiderinrichtingen en werkwijze voor het maken daarvan. |
| 英文摘要 | A semiconductor optical device includes a first semiconductor layer, and a diffraction grating disposed on the first semiconductor layer. The diffraction grating includes portions of a superlattice layer grown on the first semiconductor layer and including alternatingly arranged second semiconductor layers of a semiconductor material in which mass transport hardly occurs, during growth of other semiconductor layers and third semiconductor layers of a semiconductor material different from the material of the second semiconductor layers. The device includes a fourth semiconductor layer burying the diffraction grating. In this structure, since the second semiconductor layers are included in the diffraction grating, the shape of the diffraction grating is maintained during the vapor phase deposition of the fourth semiconductor layer. Therefore, the thickness, amplitude, and pitch of the diffraction grating that determine the optical coupling constant are controlled with high precision. |
| 公开日期 | 1995-02-16 |
| 申请日期 | 1994-07-20 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/50902]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | MITSUBISHI DENKI KABUSHIKI KAISHA |
| 推荐引用方式 GB/T 7714 | TOHRU TAKIGUCHI,KATSUHIKO GOTO,HIROTAKA KIZUKI. Optische halfgeleiderinrichtingen en werkwijze voor het maken daarvan.. NL9401192A. 1995-02-16. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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