The structure and properties of CrAlN films deposited by mid-frequency unbalanced magnetron sputtering at different substrate bias duty cycles
文献类型:期刊论文
作者 | Lv YH(吕艳红)1,2; Ji L(吉利)1![]() ![]() ![]() ![]() ![]() |
刊名 | Surface & Coatings Technology
![]() |
出版日期 | 2012 |
卷号 | 206期号:19-20页码:3961-3969 |
关键词 | CrAlN films Microstructure Hardness Thermal stability |
ISSN号 | 0257-8972 |
通讯作者 | 李红轩 |
英文摘要 | The CrAlN films were deposited on silicon and stainless steel substrates by mid-frequency unbalanced magnetron sputtering system. The influence of duty cycle on composition, structure, morphology and properties of the CrAlN films were investigated. The results showed that the CrAlN films presented NaCl-type crystal structure, indicating that the crystalline structures of the CrAlN films were predominantly cubic as that of CrN. Meanwhile, the Al and N concentration, grain size and surface roughness declined with the increase of the duty cycle. The cross section of the films changed from random porous to fine continuous column structure with duty cycle varied from 50% to 80%. The internal stress was changed to the compressive stress and declined with the increase of the duty cycle. The behavior of the incremental hardness as the duty cycle increased was also investigated. In addition, the oxidation resistance of the films deposited at different duty cycle was evaluated after annealed in air at 500–900 °C. The extent of oxidation and the oxidizing state of the element were analyzed by X-ray diffraction, X-ray photoelectron spectroscope and energy dispersive X-ray spectroscopy techniques. The results showed that the thermal stability of the film was influenced by the composition and the microstructure of the film. It was found that the film deposited at 70% had the best oxidation resistance compared with other films, where the ratio of O/N kept still about the 35.22% after annealed at 700 °C. However, the hardness of the film was significantly decreased as the heat–treatment temperature increases, which was attributed to the formation of amorphous oxides and θ-Al2O3 phase as well as the relaxation of the internal stress. |
学科主题 | 材料科学与物理化学 |
收录类别 | SCI |
资助信息 | the National Natural Science Foundation of China (Grant no. 50705093);the Innovative Group Foundation from NSFC (Grant no. 50421502) |
语种 | 英语 |
WOS记录号 | WOS:000305662400022 |
公开日期 | 2013-07-12 |
源URL | [http://210.77.64.217/handle/362003/3459] ![]() |
专题 | 兰州化学物理研究所_固体润滑国家重点实验室 兰州化学物理研究所_先进润滑与防护材料研究发展中心 |
作者单位 | 1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China |
推荐引用方式 GB/T 7714 | Lv YH,Ji L,Liu XH,et al. The structure and properties of CrAlN films deposited by mid-frequency unbalanced magnetron sputtering at different substrate bias duty cycles[J]. Surface & Coatings Technology,2012,206(19-20):3961-3969. |
APA | Lv YH,Ji L,Liu XH,Li HX,Zhou HD,&Chen JM.(2012).The structure and properties of CrAlN films deposited by mid-frequency unbalanced magnetron sputtering at different substrate bias duty cycles.Surface & Coatings Technology,206(19-20),3961-3969. |
MLA | Lv YH,et al."The structure and properties of CrAlN films deposited by mid-frequency unbalanced magnetron sputtering at different substrate bias duty cycles".Surface & Coatings Technology 206.19-20(2012):3961-3969. |
入库方式: OAI收割
来源:兰州化学物理研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。