Low temperature preparation of transparent, antireflective TiO2 films deposited at different O-2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering
文献类型：期刊论文
| 作者 | Du W(杜雯)1,2; Ye YP(冶银平)1 ; Li HX(李红轩)1; Zhao F(赵飞)1,2; Ji L(吉利)1; Quan WL(权伟龙)1,2; Chen JM(陈建敏)1; Zhou HD(周惠娣)1; Chen JM(陈建敏)
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| 刊名 | Vacuum
 |
| 出版日期 | 2012 |
| 卷号 | 86期号:9页码:1387-1392 |
| 关键词 | Titanium oxide thin film MW-ECR O-2/Ar ratio Antireflection |
| ISSN号 | 0042-207X |
| 通讯作者 | 陈建敏 |
| 英文摘要 | A serial of crystalline titanium oxide ceramic films were deposited at low temperature using microwave electron cyclotron resonance (MW-ECR) magnetron sputtering with different O2/Ar ratios. The influences of O2/Ar ratio on the deposition rate, morphology, crystalline nature, optical adsorption property of the obtained titanium oxide thin films were investigated by means of X-ray diffraction (XRD), atomic force microscopy (AFM) and UVeVis spectra. Therefore, the optimum O2/Ar ratio for deposition of anatase TiO2 thin films on unheated glass substrate was realized in a MW-ECR magnetron sputtering process. The asdeposited anatase TiO2 films were transparent and were antireflective in the visible region. |
| 学科主题 | 材料科学与物理化学 |
| 收录类别 | SCI |
| 资助信息 | the Ministry of Science and Technology of China (“973” plan, 2007CB607601);the Innovation Program Foundation (50421502);National Natural Science Foundation of China (50575217;50705093) |
| 语种 | 英语 |
| WOS记录号 | WOS:000302839400034 |
| 公开日期 | 2013-07-12 |
| 源URL | [http://210.77.64.217/handle/362003/3512]  |
| 专题 | 兰州化学物理研究所_固体润滑国家重点实验室 兰州化学物理研究所_先进润滑与防护材料研究发展中心 |
| 通讯作者 | Chen JM(陈建敏) |
| 作者单位 | 1.Chinese Acad Sci, Lanzhou Inst Chem & Phys, Lanzhou 730000, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Du W,Ye YP,Li HX,et al. Low temperature preparation of transparent, antireflective TiO2 films deposited at different O-2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering[J]. Vacuum,2012,86(9):1387-1392. |
| APA | Du W.,Ye YP.,Li HX.,Zhao F.,Ji L.,...&陈建敏.(2012).Low temperature preparation of transparent, antireflective TiO2 films deposited at different O-2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering.Vacuum,86(9),1387-1392. |
| MLA | Du W,et al."Low temperature preparation of transparent, antireflective TiO2 films deposited at different O-2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering".Vacuum 86.9(2012):1387-1392. |
入库方式： OAI收割
来源：兰州化学物理研究所
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