Synthesis and characterization of quaternary Ti-Si-C-N film deposited by middle frequency magnetron sputtering
文献类型：期刊论文
| 作者 | Jiang JL(姜金龙); Chen D(陈娣); Zhu WJ(朱伟君) |
| 刊名 | Advanced Materials Research
 |
| 出版日期 | 2012 |
| 卷号 | 581-582页码:540-543 |
| 关键词 | Ti-Si-C-N films microstructure MF magnetron sputtering |
| ISSN号 | 1022-6680 |
| 通讯作者 | 姜金龙 |
| 中文摘要 | Quaternary Ti-Si-C-N films were deposited Si wafer by middle frequency magnetron sputtering Ti80Si20 twin-targets in mixture atmosphere of Ar, CH4 and N2. Scanning electron microscopy (SEM) and x-ray diffraction (XRD) results indicate that the films present an amorphous structure with no columnar structure. These films are quite uniform and dense without large particles. The film deposited at 10 sccm CH4 and 10 sccm N2 flow rates exhibits a maximum hardness of 18.9 GPa and high elastic recovery of 97%. |
| 学科主题 | 材料科学与物理化学 |
| 收录类别 | EI |
| 资助信息 | the Natural Science Foundation of China (51105186);the Nature Science Foundation of Gansu Province (1014RJZA007);the Development Program for Outstanding Young Teachers in Lanzhou University of Technology (1010ZCX010) |
| 语种 | 英语 |
| 公开日期 | 2013-07-12 |
| 源URL | [http://210.77.64.217/handle/362003/3278]  |
| 专题 | 兰州化学物理研究所_固体润滑国家重点实验室 |
| 推荐引用方式 GB/T 7714 | Jiang JL,Chen D,Zhu WJ. Synthesis and characterization of quaternary Ti-Si-C-N film deposited by middle frequency magnetron sputtering[J]. Advanced Materials Research,2012,581-582:540-543. |
| APA | Jiang JL,Chen D,&Zhu WJ.(2012).Synthesis and characterization of quaternary Ti-Si-C-N film deposited by middle frequency magnetron sputtering.Advanced Materials Research,581-582,540-543. |
| MLA | Jiang JL,et al."Synthesis and characterization of quaternary Ti-Si-C-N film deposited by middle frequency magnetron sputtering".Advanced Materials Research 581-582(2012):540-543. |
入库方式： OAI收割
来源：兰州化学物理研究所
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