中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Preparation of ZnIn2S4 Film Electrodes by the SILAR Technique

文献类型:期刊论文

作者Yin JB(尹建波)1,2; Jia JH(贾均红)1; Yi GW(易戈文)1; Wang LQ(王立强); Jia JH(贾均红)
刊名Journal of Chinese Chemical Society
出版日期2012
卷号59期号:10页码:1365-1368
关键词Zinc indium sulfide Thin films SILAR technique Photovoltaic properties
ISSN号0009-4536
通讯作者贾均红
英文摘要Nanostructured ternary zinc indium sulfide (ZnIn2S4, ZIS) thin film electrodes were fabricated on fluorine doped tin oxide (FTO) coated glass substrates using the successive ionic layer adsorption and reaction (SILAR) technique. New procedures for the growth of ZIS films are presented. The X-Ray diffraction (XRD) results show that the ZIS films are hexagonal structure and the band gap of the as-prepared ZIS films is 2.5 eV. The photocurrent response of the films shows that the ZIS demonstrates the typical characteristic of n-type semiconductor materials and the average response photocurrent of ZIS thin film is almost two times as high as that of ZnS.
学科主题材料科学与物理化学
收录类别SCI
资助信息the National Natural Science Foundation of China (Grant No. 50972148;51175490)
语种英语
WOS记录号WOS:000309945300031
公开日期2013-07-12
源URL[http://210.77.64.217/handle/362003/3352]  
专题兰州化学物理研究所_固体润滑国家重点实验室
通讯作者Jia JH(贾均红)
作者单位1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Grad Sch, Beijing 10049, Peoples R China
推荐引用方式
GB/T 7714
Yin JB,Jia JH,Yi GW,et al. Preparation of ZnIn2S4 Film Electrodes by the SILAR Technique[J]. Journal of Chinese Chemical Society,2012,59(10):1365-1368.
APA Yin JB,Jia JH,Yi GW,Wang LQ,&贾均红.(2012).Preparation of ZnIn2S4 Film Electrodes by the SILAR Technique.Journal of Chinese Chemical Society,59(10),1365-1368.
MLA Yin JB,et al."Preparation of ZnIn2S4 Film Electrodes by the SILAR Technique".Journal of Chinese Chemical Society 59.10(2012):1365-1368.

入库方式: OAI收割

来源:兰州化学物理研究所

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