中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Process for producing light-emitting semiconductor device

文献类型:专利

作者SUZUKI, AKIKO; FUJIEDA, SHINETSU; KONO, TATSUOKI; TAKAHASHI, TOSHIHIDE; OOTSUKA, KAZUAKI; OSHIO, HIROAKI; TAMURA, HIDEO
发表日期2009-07-09
专利号US20090176323A1
著作权人KABUSHIKI KAISHA TOSHIBA
国家美国
文献子类发明申请
其他题名Process for producing light-emitting semiconductor device
英文摘要A process for producing a light-emitting semiconductor device includes: (i) mixing at least one low-molecular silane or at least one silanol with an alcohol solution containing an alkoxysiloxane to prepare a mixture solution, the amount of the silane or silanol being from 10% by weight to 50% by weight based on the dry weight of an encapsulating material to be formed; (ii) applying the mixture solution to a light-emitting element; (iii) vaporizing the alcohol solvent in the mixture solution applied and drying the residual mixture to thereby form the encapsulating material; and (iv) curing the encapsulating material.
公开日期2009-07-09
申请日期2008-12-23
状态授权
源URL[http://ir.opt.ac.cn/handle/181661/54061]  
专题半导体激光器专利数据库
作者单位KABUSHIKI KAISHA TOSHIBA
推荐引用方式
GB/T 7714
SUZUKI, AKIKO,FUJIEDA, SHINETSU,KONO, TATSUOKI,et al. Process for producing light-emitting semiconductor device. US20090176323A1. 2009-07-09.

入库方式: OAI收割

来源:西安光学精密机械研究所

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