中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor integrated optical device and method of making the same

文献类型:专利

作者FUKUDA, CHIE
发表日期2010-11-11
专利号US20100284019A1
著作权人SUMITOMO ELECTRIC INDUSTRIES, LTD.
国家美国
文献子类发明申请
其他题名Semiconductor integrated optical device and method of making the same
英文摘要A semiconductor integrated optical device includes a group III-V compound semiconductor substrate, a semiconductor optical device region, and an optical waveguide region. The semiconductor optical device region and the optical waveguide region are arranged on the group III-V compound semiconductor substrate. The semiconductor optical device region has a first optical waveguide made of group III-V compound semiconductor. The optical waveguide region has a second optical waveguide optically coupled with the first optical waveguide. The optical waveguide region further includes a silicon oxide layer. The silicon oxide layer is disposed between the group III-V compound semiconductor substrate and the second optical waveguide. The second optical waveguide is made of semiconductor which is different from the group III-V compound semiconductor.
公开日期2010-11-11
申请日期2010-05-07
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/54155]  
专题半导体激光器专利数据库
作者单位SUMITOMO ELECTRIC INDUSTRIES, LTD.
推荐引用方式
GB/T 7714
FUKUDA, CHIE. Semiconductor integrated optical device and method of making the same. US20100284019A1. 2010-11-11.

入库方式: OAI收割

来源:西安光学精密机械研究所

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