中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Method of manufacturing thin-film bonded substrate used for semiconductor device

文献类型:专利

作者KIM, DONGHYUN; KIM, DONG-WOON; KIM, MIKYOUNG; KIM, MINJU; KIM, A-RA; KIM, HYUNJOON; SHUR, JOONG WON; WOO, KWANG-JE; LEE, BOHYUN; JEON, JONGPIL
发表日期2013-12-04
专利号EP2669961A2
著作权人SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
国家欧洲专利局
文献子类发明申请
其他题名Method of manufacturing thin-film bonded substrate used for semiconductor device
英文摘要A method of manufacturing a thin-film bonded substrate used for semiconductor devices. The method includes the steps of epitaxially growing an epitaxial growth layer on a first substrate of a bulk crystal, cleaving the first substrate, thereby leaving a crystal thin film on the epitaxial growth layer, the crystal thin film being separated out of the first substrate, and bonding a second substrate to the crystal thin film, the chemical composition of the second substrate being different from the chemical composition of the first substrate. It is possible to preclude a conductive barrier layer of the related art, prevent a reflective layer from malfunctioning due to high-temperature processing, and essentially prevent cracks due to the difference in the coefficients of thermal expansion between heterogeneous materials that are bonded to each other.
公开日期2013-12-04
申请日期2013-05-29
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/54435]  
专题半导体激光器专利数据库
作者单位SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
推荐引用方式
GB/T 7714
KIM, DONGHYUN,KIM, DONG-WOON,KIM, MIKYOUNG,et al. Method of manufacturing thin-film bonded substrate used for semiconductor device. EP2669961A2. 2013-12-04.

入库方式: OAI收割

来源:西安光学精密机械研究所

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