Adjustable laser illumination pattern
文献类型：专利
| 作者 | NEMEYER, ADAM |
| 发表日期 | 2016-07-21 |
| 专利号 | US20160208988A1 |
| 著作权人 | STEINER EOPTICS, INC. |
| 国家 | 美国 |
| 文献子类 | 发明申请 |
| 其他题名 | Adjustable laser illumination pattern |
| 英文摘要 | A laser illuminator emitting a circular profile of substantially uniform intensity is presented. The laser illuminator may include a heat sink configured to optically couple to a laser light source. The heat sink may include a beam dump cavity configured to absorb light from the laser light source, and a circularizer aperture having a cylindrical, flat-top opening and being configured to shape a portion of laser light emitted from the laser light source to exit the heat sink. The laser illuminator may also include a collimation lens configured to collect the light exited from the heat sink and provide a focused beam of light, and a scatter clean-up aperture optically coupled to the collimation lens. The scatter clean-up aperture may be configured to absorb scatter laser light rays, and provide from the focused beam of light an output beam of light comprising a circular profile of substantially uniform intensity. |
| 公开日期 | 2016-07-21 |
| 申请日期 | 2015-01-16 |
| 状态 | 授权 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/54557]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | STEINER EOPTICS, INC. |
| 推荐引用方式 GB/T 7714 | NEMEYER, ADAM. Adjustable laser illumination pattern. US20160208988A1. 2016-07-21. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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