System and method for correcting laser beam wavefront of high power laser systems
文献类型：专利
| 作者 | FOURMAUX, SYLVAIN; PAYEUR, STEPHANE; KIEFFER, JEAN-CLAUDE |
| 发表日期 | 2019-05-30 |
| 专利号 | US20190165538A1 |
| 著作权人 | INSTITUT NATIONAL DE LA RECHERCHE SCIENTIFIQUE |
| 国家 | 美国 |
| 文献子类 | 发明申请 |
| 其他题名 | System and method for correcting laser beam wavefront of high power laser systems |
| 英文摘要 | A method and a system for laser pulse wavefront correction and focusing optimization for laser Wakefield interaction to accelerate electrons to high energy, and more generally for laser matter interaction where both far field and intermediate field optimization are important, allowing a robust wavefront correction and focusing optimization with a high-power laser system at its nominal laser pulse energy and laser pulse duration. The method comprises, after laser beam focusing by focusing optics, coupling an imaging unit to a wavefront sensor, thereby measuring the laser beam wavefront, and adjusting the measured laser beam wavefront to converge to a reference wavefront of the imaging unit using a spatial phase-modifying device. |
| 公开日期 | 2019-05-30 |
| 申请日期 | 2018-11-29 |
| 状态 | 申请中 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/54935]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | INSTITUT NATIONAL DE LA RECHERCHE SCIENTIFIQUE |
| 推荐引用方式 GB/T 7714 | FOURMAUX, SYLVAIN,PAYEUR, STEPHANE,KIEFFER, JEAN-CLAUDE. System and method for correcting laser beam wavefront of high power laser systems. US20190165538A1. 2019-05-30. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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