Method for making relief printing plate and relief printing plate
文献类型:专利
作者 | TASHIRO HIROSHI; MIYAGAWA ICHIROU; MATSUMOTO YOUSUKE |
发表日期 | 2012-08-09 |
专利号 | WO2012105480A1 |
著作权人 | FUJIFILM CORPORATION |
国家 | 世界知识产权组织 |
文献子类 | 发明申请 |
其他题名 | Method for making relief printing plate and relief printing plate |
英文摘要 | Provided is a method for making a relief printing plate which is superior in productivity and by which a high quality image can be formed. A method for making a relief printing plate comprises: a step for preparing an original plate for a relief printing plate comprising a cross-linked relief formation layer; and an engraving step for performing laser engraving to the original plate for the relief printing plate: wherein the cross-linked relief formation layer is formed by cross-linking a relief formation layer containing (Component A) a binder polymer and (Component B) a photothermal conversion agent, the content of Component B is 0.1 % by weight or more relative to the total solid content of the relief formation layer, the engraving step is performed using an exposure head with at least two juxtaposed semiconductor lasers having a wavelength of 700 nm to 1,300 nm, and in the engraving step, gas is blown to a laser irradiation part at a wind speed of 10 m/s or more, and the blowing angle of the gas is 0° or more and less than 90° when the angle parallel to the plate surface and in the direction opposite to the drawing direction is 0°. |
公开日期 | 2012-08-09 |
申请日期 | 2012-01-30 |
状态 | 未确认 |
源URL | [http://ir.opt.ac.cn/handle/181661/58750] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | FUJIFILM CORPORATION |
推荐引用方式 GB/T 7714 | TASHIRO HIROSHI,MIYAGAWA ICHIROU,MATSUMOTO YOUSUKE. Method for making relief printing plate and relief printing plate. WO2012105480A1. 2012-08-09. |
入库方式: OAI收割
来源:西安光学精密机械研究所
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